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Journal Articles

Characterization of air-exposed surface $$beta$$-FeSi$$_{2}$$ fabricated by ion beam sputter deposition method

Saito, Takeru; Yamamoto, Hiroyuki; Yamaguchi, Kenji; Nakanoya, Takamitsu; Hojo, Kiichi; Haraguchi, Masaharu*; Imamura, Motoyasu*; Matsubayashi, Nobuyuki*; Tanaka, Tomoaki*; Shimada, Hiromichi*

Nuclear Instruments and Methods in Physics Research B, 206, p.321 - 325, 2003/05

https://doi.org/10.1016/S0168-583X(03)00754-7
 Times Cited Count：7 Percentile：46.83(Instruments & Instrumentation)

no abstracts in English

Journal Articles

Effect of treatment for Si substrate on the crystal structure of $$beta$$-FeSi$$_{2}$$ thin film

Haraguchi, Masaharu; Yamamoto, Hiroyuki; Yamaguchi, Kenji; Sasase, Masato*; Nakanoya, Takamitsu; Saito, Takeru; Hojo, Kiichi

Shinku, 45(10), p.749 - 753, 2002/10

https://doi.org/10.3131/jvsj.45.749

no abstracts in English

Journal Articles

Fabrication of highly oriented $$beta$$-FeSi$$_{2}$$ by ion beam sputter deposition

Nakanoya, Takamitsu; Sasase, Masato*; Yamamoto, Hiroyuki; Saito, Takeru; Hojo, Kiichi

Shinku, 45(1), p.26 - 31, 2002/01

https://doi.org/10.3131/jvsj.45.26

no abstracts in English

Journal Articles

Formation of "Environmentally friendly" semiconductor ($$beta$$-FeSi$$_{2}$$) thin films prepared by ion beam sputter deposition (IBSD) method

Sasase, Masato*; Nakanoya, Takamitsu; Yamamoto, Hiroyuki; Hojo, Kiichi

Thin Solid Films, 401(1-2), p.73 - 76, 2001/12

https://doi.org/10.1016/S0040-6090(01)01485-7
 Times Cited Count：32 Percentile：80.45(Materials Science, Multidisciplinary)

no abstracts in English

Journal Articles

Formation process of $$beta$$-FeSi$$_{2}$$ on Si(111) substrate studied by means of SR-XPS

Saito, Takeru; Yamamoto, Hiroyuki; Haraguchi, Masaharu*; Imamura, Motoyasu*; Matsubayashi, Nobuyuki*; Tanaka, Tomoaki*; Shimada, Hiromichi*; Hojo, Kiichi

Photon Factory Activity Report 2001, (19), P. 205, 2001/00

http://pfwww.kek.jp/acr2001pdf/PartB/PF01UR205.pdf

no abstracts in English

Journal Articles

Investigation on the $$beta$$-FeSi$$_{2}$$ formation mechanisms on Si(111) substrate by means of SR-XPS

Saito, Takeru; Yamamoto, Hiroyuki; Hojo, Kiichi; Matsubayashi, Nobuyuki*; Imamura, Motoyasu*; Shimada, Hiromichi*

Photon Factory Activity Report 2000, P. 82, 2000/00

http://pfwww.kek.jp/acr2000/b/y00p082.pdf

no abstracts in English

6 (Records 1-6 displayed on this page)
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